Reflectometry Film Thickness

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Measure nanometer level transparent film thickness.

Spectroscopic reflectometry film thickness measurement

Film thickness is calculated by a curve fitting method using an optical model after the absolute reflectance at six wavelength is measured. Film thicknesses from several nanometers to one micron can be measured. Very small areas, such as sub-micron areas, to whole field of view film thickness distribution can be measured because our method measures film thickness at each detector pixel.

Small area film thickness measurement example

General film thickness tool measurement area is ø1 mm. SiO2 film on Si wafer : 114 nm

Film thickness distribution measurement example

LB film on Si substrate (Dyad film : 4 nm laminated)
(Provided by professor Jun Matsui, Matsui laboratory, Yamagata university)

For More information

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