Phase Shift Interferometry

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Reflectometry Film Thickness with Angstrom level height measurement.

Phase Shift Interferometry Measurement

Measure angstrom level topography using phase shift interferometry measurement.

Height distribution data is calculated by phase information analysis of four interference fringe images at different positions on the optical axis. Interference fringes are generated by single wavelength light and two-beam interference objective lens are based on the optical path distribution between the beam splitter and sample surface (height measurement range is within half the source wavelength).

8 nm step height chromium coated sample. More height resolution than white light interferometry.

SiC crystal growth.

1 nm ~ 10 nm growth step heights originated from screw dislocation point.

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